Lithography apparatus and pattern forming method u

专利名称：Lithography apparatus and pattern forming

method using the same

发明人：Ki Dong Lee,Seh Won Ahn,Sung Hoon

Pieh,Byoung Ho Park,Gyu Tae Kim

申请号：US11139618申请日：20050531

公开号：US200502788A1公开日：20051201

专利附图：

摘要：A lithography apparatus is provided. The apparatus includes: a stage, a first lightsource unit, an optical system, an image obtaining means, an image edit means, an LC

panel, and a second light source unit. The LC panel is coupled with the optical system andreceives a signal of the image edited by the image edit means and displays the receivedimage to perform a photo mask function. The second light source unit provides lightused in performing an exposure on the test material using the imaged displayed on theLC panel for a photo mask.

申请人：Ki Dong Lee,Seh Won Ahn,Sung Hoon Pieh,Byoung Ho Park,Gyu Tae Kim

地址：Sungnam-si KR,Seoul KR,Seoul KR,Kyungiu-si KR,Seoul KR

国籍：KR,KR,KR,KR,KR

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