Method and apparatus for reducing particulates on

专利名称：Method and apparatus for reducing

particulates on photomasks

发明人：Yen, Yung-Tsai,Wang, Ching-Bore申请号：EP87301300.7申请日：19870216公开号：EP0252574A2公开日：19880113

摘要：A process for fabricating a pellicle is described. The process includes the stepsof forming a membrane having an upper side and an underside, and then applying anadhesive substance to the underside of the membrane. This step of applying an adhesivesubstance normally comprises either spraying or spinning on a non-solidifying liquid.Another aspect of the invention is a pellicle which includes a thin membrane having anupper side and an underside, a frame member having one side mounted to themembrane underside, and an adhesive coating applied to the underside of themembrane.

申请人：YEN, Yung-Tsai

地址：1192 St. Anthony Court Los Altos, CA 94022 US

国籍：US

代理机构：Kerr, Simonne June

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