Vacuum processing system

专利名称：Vacuum processing system

发明人：Noriyuki Takeuchi,Masaaki Kajiyama,Fumio

Kondo,Masao Matsumura,Takeshi Yoshioka

申请号：US08/062853申请日：19930518公开号：US05398481A公开日：19950321

摘要：Several vacuum process steps are applied to substrates such as a wafer using avacuum container for storing and transporting the substrates under vacuum. The vacuumcontainer comprises a container body having a main opening for inserting a substrate andtaking out the substrate, a lid engageable with the container body for closing and sealingthe main opening of the container body, and a gate provided on one of the containerbody and the lid for performing at least one of evacuating an interior of the vacuumcontainer and raising the pressure of the interior of the vacuum container to ambient.

申请人：EBARA CORPORATION

代理机构：Armstrong, Westerman, Hattori, McLeland & Naughton

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