Device and method for substrate

专利名称：Device and method for substrate发明人：中田 勝喜,谷垣内 平道申请号：JP2017229283申请日：20171129公开号：JP2019102531A公开日：20190624

专利附图：

摘要：Problem to be solved: to provide a substrate processing apparatus capable ofpreventing the floating of the brittle material substrate by raising the belt andprocessing the substrate with high accuracy. The substrate processing apparatuscomprises a belt 11 for transporting a brittle material substrate, and a clamping device40 for clamping a brittle material substrate mounted on the belt 11.The clamp device 40

comprises a substrate support portion 51 for supporting a brittle material substratefrom below, an arm 57 which is rotated or moved relative to the substrate support part51 and sandwiches the brittle material substrate between the substrate support part 51and the substrate support part 51, and a hole is formed in the belt. The substratesupport is disposed in the hole, and the shape of the hole is tapered toward the directionof conveyance of the brittle material substrate.Diagram

申请人：三星ダイヤモンド工業株式会社

地址：大阪府摂津市香露園３２番１２号

国籍：JP

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