Multi coil target design

专利名称：Multi coil target design

发明人：Ming-Chin Tsai,Bo-Hung Lin,Chung-En

Kao,Chin-Hsiang Lin

申请号：US13366805申请日：20120206公开号：US09279179B2公开日：20160308

专利附图：

摘要：In some embodiments, the present disclosure relates to a plasma processingsystem configured to form a symmetric plasma distribution around a workpiece. In someembodiments, the plasma processing system comprises a plurality of coils symmetrically

positioned around a processing chamber. When a current is provided to the coils,separate magnetic fields, which operate to ionize the target atoms, emanate from theseparate coils. The separate magnetic fields operate upon ions within the coils to form aplasma on the interior of the coils. Furthermore, the separate magnetic fields aresuperimposed upon one another between coils to form a plasma on the exterior of thecoils. Therefore, the disclosed plasma processing system can form a plasma thatcontinuously extends along a perimeter of the workpiece with a high degree ofuniformity (i.e., without dead spaces).

申请人：Ming-Chin Tsai,Bo-Hung Lin,Chung-En Kao,Chin-Hsiang Lin

地址：Hsinchu TW,Kaohsiung TW,Toufen Township TW,Hsinchu TW

国籍：TW,TW,TW,TW

代理机构：Eschweiler & Associates, LLC

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