Shadow mask for cathode ray tube

专利名称：Shadow mask for cathode ray tube发明人：Sang-Ho Jeon,Do-Hun Pyun申请号：US10400631申请日：20030328

公开号：US20030222562A1公开日：20031204

专利附图：

摘要：A shadow mask for a cathode ray tube includes an aperture area having aplurality of apertures passing electron beams, a non-aperture area extending a

predetermined distance from a circumference of the aperture area and a skirt extendinga predetermined distance from an outside circumference of the non-aperture area and

bent at a predetermined angle to the non-aperture area, wherein the aperture area haspredetermined curvature radii, and wherein if a curvature radius in a horizontal directionof the aperture area is R, and a curvature radius in a vertical direction is R, the followingcondition is satisfied,

申请人：SAMSUNG SDI CO., LTD.

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