MICROCHIP AND PROCESS FOR PRODUCING MICROCHIP

专利名称：MICROCHIP AND PROCESS FOR

PRODUCING MICROCHIP

发明人：HIRAYAMA Hiroshi,TAKIMURA Toshinori申请号：EP09808199.5申请日：20090810公开号：EP2315037A1公开日：20110427

专利附图：

摘要：A microchip (1) in which a resinous film can be inhibited from sagging into achannel. The microchip (1) comprises: a resinous base (2) having a channel groove formetherein; and a resinous film bonded to that side of the base on which the channel groove

has been formed. A fine channel (3) including channels (3A) and channels (3B) is formed bythe channel groove and the resinous film (10). The total length of the channels (3B), whichextend parallel to the X direction for the resinous base (2), is large than the total lengthof the channels (3A), which extend parallel to the Y direction for the resinous base (2).The resinous base (2) has been bonded to the resinous film so that the sides parallel tothe channels (3B) are parallel to the TD for the resinous film and that the sides parallelto the channels (3A) are parallel to the MD for the resinous film.

申请人：Konica Minolta Opto, Inc.

地址：2970 Ishikawa-machi Hachioji-shi, Tokyo 192-8505 JP

国籍：JP

代理机构：Henkel, Feiler & Hänzel

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