Microchip and Process for Producing Microchip

专利名称：Microchip and Process for Producing

Microchip

发明人：Hiroshi Hirayama,Toshinori Takimura申请号：US13059370申请日：20090810

公开号：US20110142716A1公开日：20110616

摘要：A microchip in which a resinous film can be inhibited from sagging into a channel.The microchip comprises: a resinous substrate having a channel groove formed therein;and a resinous film bonded to a surface of the substrate on which the channel groove hasbeen formed. A micro-channel including channels A and channels B is formed by thechannel groove and the resinous film The total length of the channels B, which is parallelto the X direction for the resinous substrate is larger than the total length of thechannels A, which is parallel to the Y direction for the resinous substrate The resinoussubstrate has been bonded to the resinous film so that the sides parallel to the channelsB are parallel to the TD direction of the resinous film and that the sides parallel to thechannels A are parallel to the MD direction of the resinous film.

申请人：Hiroshi Hirayama,Toshinori Takimura

地址：Tokyo JP,Tokyo JP

国籍：JP,JP

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