Solar cell and method of manufacturing solar cell

专利名称：Solar cell and method of manufacturing

solar cell

发明人：藤田 和範,藤嶋 大介,角村 泰史,田口 幹朗,益子 慶

一郎

申请号：JP2018501077申请日：20170126公开号：JP6719099B2公开日：20200708

摘要：According to one example of an embodiment of the present invention, a solarbattery cell 10 is provided with: an n-type crystalline silicon wafer 11; a first passivationlayer 12, which is formed on the light receiving surface of the n-type crystalline siliconwafer 11, and which is configured by having, as a main component, silicon oxide, siliconcarbide, or silicon nitride; an n-type crystalline silicon layer 13 formed on the firstpassivation layer 12; a second passivation layer 16 formed on the rear surface of the n-type crystalline silicon wafer 11; and a p-type amorphous silicon layer 17 formed on thesecond passivation layer 16.

申请人：パナソニックＩＰマネジメント株式会社

地址：大阪府大阪市中央区城見２丁目１番６１号

国籍：JP

代理人：特許業務法人ＹＫＩ国際特許事務所

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