Array substrate for display device and method of f

专利名称：Array substrate for display device and

method of fabricating the same

发明人：Hee-Dong Choi申请号：US14737078申请日：20150611公开号：US09312277B2公开日：20160412

专利附图：

摘要：An array substrate for a display device includes: a substrate; first and secondgate electrodes of impurity-doped polycrystalline silicon on the substrate; a gateinsulating layer on the first and second gate electrodes; first and second active layers of

intrinsic polycrystalline silicon on the gate insulating layer, the first and second activelayers corresponding to the first and second active layers, respectively; an interlayerinsulating layer on the first and second active layers and including first to fourth activecontact holes, the first and second active contact holes exposing side portions of the firstactive layer, the third and fourth active contact holes exposing side portions of thesecond active layer; first and second ohmic contact layers of impurity-doped amorphoussilicon on the interlayer insulating layer, the first ohmic contact layer contacting the firstactive layer through the first and second active contact holes, the second ohmic contactlayer contacting the second active layer through the third and fourth active contact hole;first source and drain electrodes on the first ohmic contact layer and second source anddrain electrodes on the second ohmic contact layer; a data line on the interlayerinsulating layer, the data line connected to the first source electrode; a first passivationlayer on the first source and drain electrodes, the second source and drain electrodesand the data line; a gate line on the first passivation layer, the gate line connected to thefirst gate electrode and crossing the data line to define a pixel region; a second

passivation layer on the gate line; and a pixel electrode on the second passivation layer,the pixel electrode connected to the second drain electrode.

申请人：LG DISPLAY CO., LTD.

地址：Seoul KR

国籍：KR

代理机构：Dentons US LLP

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